Dense non-volatile memory array and method of fabrication

ABSTRACT

A non-volatile memory array has word lines spaced a sub-F (sub-minimum feature size F) width apart and bit lines generally perpendicular to the word lines. The present invention also includes a method for word-line patterning of a non-volatile memory array which includes generating sub-F word lines from mask generated elements with widths of at least a minimum feature size F.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims benefit from U.S. Provisional Patent ApplicationNo. 60/699,857, filed Jul. 18, 2005, from U.S. Provisional PatentApplication No. 60/739,426, filed Nov. 25, 2005, and from U.S.Provisional Patent Application No. 60/800,022, filed May 15, 2006, allof which are hereby incorporated in their entirety by reference.

FIELD OF THE INVENTION

The present invention relates to non-volatile memory cells generally andto a method of fabrication thereof in particular.

BACKGROUND OF THE INVENTION

Dual bit memory cells are known in the art. One such memory cell is theNROM (nitride read only memory) cell 10, shown in FIG. 1 to whichreference is now made, which stores two bits 12 and 14 in a nitridebased layer 16, such as an oxide-nitride-oxide (ONO) stack, sandwichedbetween a polysilicon word line 18 and a channel 20. Channel 20 isdefined by buried bit line diffusions 22 on each side which are isolatedfrom word line 18 by a thermally grown oxide layer 26, grown after bitlines 22 are implanted. During oxide growth, bit lines 22 may diffusesideways, expanding from the implantation area.

NROM cells are described in many patents, for example in U.S. Pat. No.6,649,972, assigned to the common assignees of the present invention,whose disclosure is incorporated herein. Where applicable, descriptionsinvolving NROM are intended specifically to include relatedoxide-nitride technologies, including SONOS(Silicon-Oxide-Nitride-Oxide-Silicon), MNOS(Metal-Nitride-Oxide-Silicon), MONOS (Metal-Oxide-Nitride-Oxide-Silicon)and the like used for NVM devices. Further description of NROM andrelated technologies may be found at “Non Volatile Memory Technology”,2005 published by Saifun Semiconductor and materials presented at andthrough http://siliconnexus.com, “Design Considerations in Scaled SONOSNonvolatile Memory Devices” found at:

http://klabs.org/richcontent/MemoryContent/nvmt_symp/nvmts_(—)2000/presentations/bu_white_sonos_lehigh_univ.pdf, “SONOS Nonvolatile Semiconductor Memoriesfor Space and Military Applications” found at:

http://klabs.org/richcontent/MemoryContent/nvmt_symp/nvmts_(—)2000/papers/adams_d.pdf,“Philips Research—Technologies—Embedded Nonvolatile Memories” found at:http://research.philips.com/technologies/ics/nvmemories/index.html, and“Semiconductor Memory: Non-Volatile Memory (NVM)” found at:http://ece.nus.edu.sg/stfpage/elezhucx/myweb/NVM.pdf, all of which areincorporated by reference herein in their entirety.

As shown in FIG. 2, to which reference is now briefly made, NROMtechnology employs a virtual-ground array architecture with a densecrisscrossing of word lines 18 and bit lines 22. Word lines 18 and bitlines 22 optimally can allow a 4 F² size cell, where F designates theminimum feature size of an element of the chip for the technology inwhich the array was constructed. For example, the feature size for a 65nm technology is F=65 nm.

For NROM cells, the minimum length of a cell is 2 F, being the minimumlength (1 F) of a bit line 22 plus the minimum length (1 F) of a spacing23 between bit lines 22. The minimum width of a cell is also 2 F, beingthe minimum width (1 F) of a word line 18 plus the minimum width (1 F)of a spacing 19 between word lines 18. Thus, the theoretical minimumarea of a cell is 4 F².

It should be noted, that it is possible to create bit lines 22 of lessthan 1 F, but in such cases the length of associated spacing 23 must beincreased by a corresponding amount, such that the total length of a bitline 22 and an associated spacing 23 must be at least 2 F. Similarly, itis possible to create word lines 18 of less than 1 F, but in such casesthe width of associated spacing 19 must be increased by a correspondingamount, such that the total width of a word line 18 and an associatedspacing 19 must be at least 2 F.

Unfortunately, most NROM technologies which use the more advancedprocesses of less than 170 nm (where F=0.17 μm) employ a larger cell, of5-6 F², due to the side diffusion of the bit lines which required a bitline spacing of about 1.6 F.

There exists a dual polysilicon process (DPP) for the NROM cell, where afirst polysilicon layer is deposited and etched in columns between whichbit lines 22 are implanted. Word lines 18 are then deposited as a secondpolysilicon layer, cutting the columns of the first polysilicon layerinto islands between bit lines 22. Before creating the secondpolysilicon layer, bit line oxides are deposited between the firstpolysilicon columns, rather than grown as previously done. The resultare bit line oxides that remain within the feature size of thepolysilicon columns. In some DPP processes, spacers are created on thesides of the first polysilicon columns, which reduces the space for thebit lines. This enables the bit lines to be thinner than 1 F. Forexample, bit lines 22 might be 0.7 F while the columns between themmight be 1.6 F. This produces a width of 2.3 F and a resultant cell areaof 4.6 F², which is closer to the theoretical minimum of 4 F² than forprior processes, but still not there. Approaching the theoreticalminimum is important as there is a constant push in industry to put morefeatures into the same real estate.

SUMMARY OF THE PRESENT INVENTION

An object of the present invention is to, at least, increase the densityof memory arrays.

There is therefore provided, in accordance with a preferred embodimentof the present invention, a non-volatile memory array with word linesspaced a sub-F (sub-minimum feature size F) width apart and bit linesgenerally perpendicular to the word lines.

Further in accordance with a preferred embodiment of the presentinvention, the word lines are a sub-F width.

Still further, in accordance with a preferred embodiment of the presentinvention, the array is a NROM (nitride read only memory) array.

Additionally, in accordance with a preferred embodiment of the presentinvention, the sub-F spacing is filled with dielectric.

Moreover, in accordance with a preferred embodiment of the presentinvention, the sub-F word line width is at least 0.5 F and the sub-Fspacing is less than 0.5 F.

Further, in accordance with a preferred embodiment of the presentinvention, the dielectric is oxide-nitride-oxide.

Still further, in accordance with an alternative preferred embodiment ofthe present invention, the sub-F word line width is at least 0.1 F andthe sub-F spacing is at least 0.7 F.

Moreover, in accordance with a preferred embodiment of the presentinvention, the word lines are formed from polysilicon spacers.

Additionally, there is provided, in accordance with a preferredembodiment of the present invention, a method for word-line patterningof a non-volatile memory array includes generating sub-F word lines frommask generated elements with widths of at least a minimum feature sizeF.

Further, in accordance with a preferred embodiment of the presentinvention, the generating includes generating a first set of rows fromthe mask generated elements, and then generating a second set of rows,interleaved between the first set of rows, from the first set of rows.

Still further, in accordance with a preferred embodiment of the presentinvention, the method also includes etching polysilicon columns, whichare generally perpendicular to the rows, self-aligned to the first andsecond sets of rows, to generate word line gates and filling spacesbetween the rows and the word line gates with insulating material.

Moreover, in accordance with a preferred embodiment of the presentinvention, the first and second steps of generating generate sub-F widthrows.

Additionally, in accordance with a preferred embodiment of the presentinvention, the rows are formed of polysilicon or metal.

There is also provided, in accordance with a preferred embodiment of thepresent invention, a method for word-line patterning of a non-volatilememory array. The method includes: having polysilicon columns coveringactive areas of the array; creating an extended mask for a first set ofrows from a mask having rows with widths of at least the minimum featuresize F, the extended mask having sub-F openings between the rows;filling the sub-F openings with polysilicon to create the first set ofrows above the polysilicon columns; removing the extended mask; addingextensions to the first set of rows to generate a second set of sub-Fopenings between those rows; filling the second set of sub-F openingswith polysilicon to create a second set of rows; capping the first andsecond sets of rows; removing the extensions; etching the polysiliconcolumns using the capped rows as a mask to generate word line gates; andfilling spaces between the rows and the word line gates with insulatingmaterial.

Further, in accordance with a preferred embodiment of the presentinvention, the rows are formed of metal, which may tungsten or cobalt.

There is also provided, in accordance with a preferred embodiment of thepresent invention, a non-volatile memory array including a plurality ofpolysilicon gates, one per memory cell, metal word lines each connectinga row of the gates and bit lines generally perpendicular to the wordlines.

Further, in accordance with a preferred embodiment of the presentinvention, the gates are self-aligned to the word lines and to the bitlines.

Moreover, in accordance with a preferred embodiment of the presentinvention, the metal word lines are formed with a dual damasceneprocess.

BRIEF DESCRIPTION OF THE DRAWINGS

The subject matter regarded as the invention is particularly pointed outand distinctly claimed in the concluding portion of the specification.The invention, however, both as to organization and method of operation,together with objects, features, and advantages thereof, may best beunderstood by reference to the following detailed description when readwith the accompanying drawings in which:

FIG. 1 is a schematic illustration of an NROM memory cell;

FIG. 2 is a schematic illustration of a layout of the cell of FIG. 1;

FIG. 3 is a schematic illustration of a layout of an array, constructedand operative in accordance with a preferred embodiment of the presentinvention;

FIGS. 4A and 4B are flow chart illustrations of a word-line patterningmethod for creating the array of FIG. 3, constructed and operative inaccordance with a preferred embodiment of the present invention;

FIGS. 5A, 5B, 6A, 6B, 6C, 6D, 6E, 6F, 6G, 6H, 6I, 6J, 6K, 6L and 6M areschematic illustrations of various steps within the process of FIGS. 4Aand 4B;

FIG. 7 is a flow chart illustration of a method for pre-word-linepatterning, which is useful for the method of FIGS. 4A and 4B;

FIGS. 8A, 8B and 8C are schematic illustrations of various steps withinthe process of FIG. 7;

FIGS. 9A and 9B are flow chart illustrations of an alternativeembodiment of the word line patterning method of FIGS. 4A and 4B;

FIGS. 10A, 10B, 10C and 10D are schematic illustrations of various stepswithin the process of FIGS. 9A and 9B;

FIG. 11 is a schematic illustration of a layout of an array, constructedand operative in accordance with a preferred embodiment of the presentinvention;

FIG. 12 is a flow chart illustration of a spacer word-line patterningmethod for creating the array of FIG. 11, constructed and operative inaccordance with a preferred embodiment of the present invention;

FIGS. 13A, 14A, 15A, 16A, 17A, 18A, 19A, 20A, 21A, 22A, 23A, 24A, 25Aand 26A are top view illustrations of the results of various stepswithin the process of FIG. 12; and

FIGS. 13B, 14B, 15B, 16B, 17B, 18B, 19B, 20B, 21B, 22B, 23B, 24B, 25Band 26B are cross sectional views of FIGS. 13A, 14A, 15A, 16A, 17A, 18A,19A, 20A, 21A, 22A, 23A, 24A, 25A and 26A, respectively.

It will be appreciated that for simplicity and clarity of illustration,elements shown in the figures have not necessarily been drawn to scale.For example, the dimensions of some of the elements may be exaggeratedrelative to other elements for clarity. Further, where consideredappropriate, reference numerals may be repeated among the figures toindicate corresponding or analogous elements.

DETAILED DESCRIPTION OF THE PRESENT INVENTION

In the following detailed description, numerous specific details are setforth in order to provide a thorough understanding of the invention.However, it will be understood by those skilled in the art that thepresent invention may be practiced without these specific details. Inother instances, well-known methods, procedures, and components have notbeen described in detail so as not to obscure the present invention.

The present invention may provide an increased number of bits per givenarea over the prior art. In general, increasing the density of the cellsincreases the number of bits in a given area. One way to increase thedensity is to reduce the length of the cells. Another method to increasedensity is to utilize the space between word lines to insert more wordlines. In an ideal situation, the cell size may be reduced by half byhaving 2 word lines in an opening of 2 F (resulting in 1 word line in a1 F pitch). Such a “double density” array may store twice as much data.

Applicants have realized that such a double density array generatescells significantly smaller than the 4 F² minimum size of the prior art.It further reduces the pitch between word lines to less than the 2 Fminimum of the prior art.

Applicants have realized that there may be more than one way to createsuch a double density array. The present application may thereforecomprise more than one preferred embodiment for such creation.

In the first such preferred embodiment, shown in FIGS. 3-10D, a selfaligning process may be used to generate sub-1 F word lines from aninitial mask generated by a standard lithographic process. Word linespacings may also be sub-1 F and may be filled with a dielectric.

In an alternative preferred embodiment, discussed with respect to FIGS.11A-26B, sub-1 F word lines may be generated using spacer technology.

Self-Aligning Embodiment

Reference is now made to FIG. 3, which illustrates a novel, dense array30, constructed and operative in accordance with the first preferredembodiment of the present invention. Array 30 may reduce the minimumsize of a memory cell, by providing sub-minimum-feature-size, “sub-F”,word lines 32 and word line spacings 34 (resulting in a word line widththat is less than 1 F and a spacing that is less than 1 F). For example,in FIG. 3, word line spacings 34 are shown as an exemplary 0.3 F.Because word line spacings 34 may be so narrow, they may be filled witha dielectric, such as ONO, nitride or oxide.

Word lines 32 may also be thin (of sub-F width). In FIG. 3, the width ofword lines 32 is shown as 0.7 F. It will be appreciated that the widthsof word lines 32 and spacings 34 in FIG. 3 are exemplary; other sub-Fwidths are possible and are included in the present invention. Forexample, for a 1 F pitch (which includes the word line width togetherwith the spacing), spacings 34 may be 0.4 F wide and word lines 32 mightbe 0.6 F wide. For a 1.2 F pitch, spacings 34 might be 0.4 F and wordlines 32 might be 0.8 F. Alternatively, spacings 34 might be 0.3 F wideand word lines 32 might be 0.9 F wide. It will be appreciated that, inall of the above examples, there is a substantial reduction of the wordline spacing and a smaller reduction of the word line width.

It will also be appreciated that, in the present invention, the widthsof word lines 32 and spacings 34 are not required to be the same. InFIG. 3, word lines 32 are wider than word line spacings 34. However, thepitch for word lines 32 may be 1 F and the minimum spacing between wordlines may be electrically limited to the point at which the dielectricbetween word lines 32 breaks down.

For example, oxide breakdown is 9-11 MV/cm, which, for a 10V voltagedrop between word lines during programming or erasing, may occur with adielectric thickness of about 10 nm. Thus, for this type of dielectric,a minimal width for word line spacing 34 may be 10 nm. For reliabilityand quality purposes, such a minimal word line spacing may be increasedto 15 nm.

Assuming a pitch of 2.6 F between bit lines 22, as is possible for dualpolysilicon process (DPP) type memory cells and as shown in FIG. 3, thecell size of the example in FIG. 3 may be 2.6 F×1 F=2.6 F², aconsiderably smaller size than in the prior art. It will be appreciatedthat the minimum cell size for the present invention is 2 F×1 F=2 F².

It will be appreciated that the present invention may also beimplemented in non-DPP type memory cells, and also for non-NROM typememory cells. Furthermore, the memory cells may store 2 bits or 4 bits,with no change in the basic physics and operating mode of the cell.

In accordance with a preferred embodiment of the present invention andas will be shown hereinbelow, sub-F elements may be generated fromelements which are the minimum feature size F or larger. As will bedescribed hereinbelow, the present invention utilizes commonlithographic concepts to generate such small features.

Reference is now made to FIGS. 4A and 4B, which illustrate the processand to FIGS. 5A and 5B and 6A-6M, which illustrate various steps withinthe process of FIGS. 4A and 4B.

The process begins, in step 100, with the process steps prior to wordline patterning. The process steps may be any suitable set of steps, anexemplary set of which are described hereinbelow with respect to FIG. 7.Other suitable DPP type process steps may be found in the followingapplications assigned to the common assignees of the present invention,which applications are incorporated herein by reference: U.S. patentapplication Ser. No. 11/247,733 filed Oct. 11, 2005, U.S. patentapplication Ser. No. 11/336,093 filed Jan. 20, 2006 and U.S. patentapplication Ser. No. 11/440,624, filed May 24, 2006.

An exemplary cross-section of the memory array is shown in FIG. 5A.Columns of bit lines 50 and pocket implants 51 may be implanted into asubstrate 42. Above bit lines 50 may be squared bit line oxides 52.Channels 53 may be formed between bit lines 50 and columns of ONOelements 55 may be formed above channels 53 and between bit line oxides52. Columns 54 of polysilicon, of a first polysilicon layer, may beformed above ONO elements 55 and may protect ONO elements 55 during theword line patterning described hereinbelow. Columns 54 may be formed ofpolysilicon or, alternatively, of polysilicon with oxide or nitridespacers (or a combination thereof) on their sides.

In accordance with a preferred embodiment of the present invention, thememory array may be planarized (step 101) prior to beginning word linepatterning. An exemplary planarizing operation may bechemical-mechanical polishing (CMP). Thus, columns 54 of polysilicon andcolumns 52 of bit line oxides may, together, provide a flat surface forword line patterning. In one embodiment, polysilicon columns 54 may bedeposited to 60 nm and may be planarized down to 55 nm; however, inalternative embodiments, polysilicon columns may have an initialthickness of 30-100 nm.

With polysilicon columns 54 protecting ONO elements 55, the word linepatterning may begin. In accordance with a preferred embodiment of thepresent invention, the word lines may be generated as rows first,perpendicular to polysilicon columns 54, which may be separated into twointerleaved types. For ease of discussion, the rows will be called here“even” rows and “odd” rows. The present discussion will show thecreation of the even rows first, it being appreciated that the odd rowsmay be created first just as easily. Once both sets of rows aregenerated, the word lines may be created therefrom. It will beappreciated that, since the two sets of rows are not created at the sametime, they may have slightly different widths.

To create the even rows, a first mask, such as a nitride hard mask, maybe deposited (step 102) on the array and may be patterned into rows 60.FIG. 5B is a plan view of the array, showing polysilicon columns 54 androws 60 of the first mask. As can be seen, polysilicon columns 54 are ofwidth 1.6 F and are separated by a distance of 1 F while rows 60 may beof a mask width W of 1 F or more and may be separated from its neighborby a spacing D of 1 F or larger, defining openings 61. For the exampledescribed hereinbelow, for a 63 nm technology, mask width W is 75 nm(which is larger than the minimum feature size of 63 nm) and spacing Dis 75 nm. Alternatively, mask width W might be 100 nm and spacing Dmight also be 100 nm. In another embodiment, mask width W might be 63 nmand spacing D might be 63 nm. In general, mask width W and spacing D arethe same but this is not required.

FIG. 6A is a cross-sectional view along one polysilicon column 54 ofFIG. 5B. Thus, it shows polysilicon column 54 atop ONO layer 55 on topof substrate 42. Moreover, it shows even mask rows 60, in cross-section,above polysilicon column 54.

In step 104, an extended mask structure may be generated by extendingmask width W of rows 60. For example, as shown in FIG. 6B, a liner 62,of width L, may first be deposited over rows 60 and, as shown in FIG.6C, may then be etched back to generate spacers 62′. If the first maskis of nitride, then liner 62 (and the subsequent spacers 62′) may alsobe of nitride. The spacer etch may be such to make spacers 62′ withvertical sides and a planarization step may be performed later to makethem flat. FIG. 6D shows them steep and rectangular.

Spacers 62′ reduce the size of opening 61, now labeled 61′, by twice thewidth L of liner 62. Thus, reduced opening 61′ may be of a sub-F widthD′=D-2 L. Similarly, spacers 62′ may increase the mask width W of rows60 to W′=W+2 L.

For the 75/75 mask width, liner 62 may be of width L=12.5 nm, whichgenerates sub-F opening 61′ of spacing D′=50 nm and extended mask widthW′ of 100 nm. It will be appreciated that sub-F openings 61′ are notonly smaller than the mask width rows 60 but also smaller than theminimum feature size F of 63 nm.

In step 106, polysilicon 64 may be deposited on the array to create theeven rows. The polysilicon may cover the array and may fill sub-Fopenings 61′. The resultant array may be planarized, such as by a CMPprocess, to remove polysilicon 64 from everywhere but between spacers62′. The CMP process may be continued to flatten spacers 62′ as well.The CMP process may remove polysilicon 64 from the periphery as well.

It will be appreciated that the resultant polysilicon rows 64 are ofwidth D′, which is a sub-F width. In the 63 nm technology of FIG. 5,polysilicon rows 64 are a sub-F, 50 nm width.

With the even rows finished, the process may continue to the odd rows.Initially, the first mask may be removed (step 108). In the example,both rows 60 and spacers 62′ are of nitride and thus, may be removedtogether with a nitride wet etch, leaving an extended opening 70 (shownin FIG. 6E) of width W′=W+2 L. In the present example, opening 70 may beof 100 nm. If the first mask is of a material other than nitride, thenit may be removed with the appropriate etchant. The nitride (or othermaterial) hard mask is also removed from the periphery during this step.

The openings for the odd rows may be generated (step 110) by creatinganother extended structure, this time from the existing even polysiliconrows 64. As shown in FIG. 6F, another liner, labeled 72, may bedeposited on the array and may be etched back to a spacer 72′ (FIG. 6G).Spacer 72′ may be of nitride, as before, or of another material. Forthis mask, the spacer may be of sufficient width M to reduce extendedopening 70 from extended width W′ to a sub-F opening 70′ whose width W″may be generally equivalent to D′, the width of even polysilicon rows60. Typically, W″=W′−2M. Moreover, second spacer width M may typicallybe twice first spacer width L. For the present example, width M of liner72 may be 25 nm. If a vertical wall spacer is desired, it may begenerated through multiple deposition and etch processes.

In step 112, polysilicon 74 may be deposited on the array to create theodd rows. As shown in FIG. 6H, polysilicon 74 may cover the array andmay fill sub-F openings 70′, resulting in alternating rows ofpolysilicon, even rows 64 alternating with odd rows 74. In theperiphery, polysilicon layer 74 is on top of polysilicon layer 54, toform the polysilicon gates of the periphery transistors. The resultantarray may be planarized, such as by a CMP process, to remove polysilicon74 from everywhere in the array but between spacers 72′. The CMP processmay consume and flatten some of spacers 72′ as well.

It will be appreciated that, at this point, all of the rows (both evenand odd) have been generated but the word lines have not been fullygenerated. In step 114, the rows may be capped with self-aligned oxidecaps 76 (FIG. 6H) or some other etch resistant material. If an oxide capis used, step 114 may be an oxidation step, for example, 20 nm of wetoxidation at 750° C., which may oxidize both polysilicon rows 64 and 74,as well as the polysilicon covering the periphery. Alternatively,polysilicon rows 64 and 74 may have metallized caps (created via ametallization step). For example, a self aligned Tungsten depositionprocess may be used or a silicidation of the polysilicon may be done torender it more resistant to etch. Once again, only polysilicon rows 64and 74 and the polysilicon of the periphery will be metallized. As canbe seen in FIG. 6H, caps 76 may combine with some of the polysilicon,thereby reducing the height of rows 64 and 74.

Caps 76 may now be utilized to define the word lines. First, the sub-Fmask (spacers 72′) may be removed (step 116) from between rows 64 and74, leaving sub-F openings 78 (FIG. 6I) between rows 64 and 74. Fornitride spacers, the removal process may be a nitride wet removaloperation.

Next, polysilicon columns 54 may be etched (step 118) down to ONO layer55, using caps 76 on each of polysilicon rows 64 and 74 as the hardmask. FIG. 6J shows one polysilicon column 54 of the previous figuresetched into multiple islands, each marked 54′.

FIG. 6K, an expanded isometric view of FIG. 6J, shows the result of thepolysilicon etch more clearly. The lowest layer is substrate 42 coveredwith three ONO columns 55 and the self-aligned bit lines 50 (with pocketimplants 51) implanted into substrate 42. The second layer in FIG. 6Kshows three bit line oxide columns 52 interlaced with what used to bethree polysilicon columns 54 but are now etched into a multiplicity ofpolysilicon islands 54′ which may form the gates of the cells. Thefourth layer of FIG. 6K shows the alternating word line rows 64 and 74and the top layer shows the rows of caps 76.

It will be appreciated that this polysilicon etching step isself-aligned, ensuring that the resultant word lines, labeled 80 in FIG.6L, maintain the spacing defined by rows 64 and 74. It will further beappreciated that each word line 80 may be formed of one row 64 or 74connecting gates 54′ of first polysilicon. Finally, as can be seen fromFIG. 6K, it will be appreciated that the polysilicon etch leaves bitline oxide columns 52 intact.

Returning to FIG. 6L, word lines 80 may have sub-F width W_(sl) and maybe separated by sub-F spacing D_(sl), where D_(sl)=M and W_(sl)=W″=D″.In the present example, sub-F width W_(sl) is 50 nm and sub-F spacingD_(sl) is 25 nm. Moreover, word lines 80 may have a height which is thecombined height of polysilicon gates 54′ and of polysilicon rows 64 and74. For example, they might be 85 nm thick.

With word lines 80 defined, openings 78 (FIG. 6I) there between may befilled (step 120) with an insulator. One insulator may be of oxide andmay be generated by depositing oxide onto the array. Another one, shownin FIG. 6L, may be an ONO dielectric and may be generated by firstdepositing an oxide liner 82, such as of 6 nm, following by deposition,into the remaining opening, of a nitride liner 84 of 13 nm. The ONOfiller may have a lower defect density than the oxide. Furthermore, ifthere is a defect in the oxide portion of the ONO filler, the nitridemay act to substantially reduce the leakage current between neighboringword lines.

Finally, the word line patterning may finish with a polishing step (step122), such as a CMP step, which may remove the surface layers of liners84 and 82 as well as caps 76. It may also remove some of polysiliconword lines 80. For example, the thickness of word lines 80 in thepresent example may be reduced to 80 nm. Alternatively, for metalizedcaps, the oxide or ONO may remain on top of the metal. The result foroxide caps, shown in FIG. 6M, may be a set of word lines 80 of sub-Fwidth W_(sl) separated by sub-F distances D_(sl). It is noted that sub-Fdistances D_(sl) may be less than half of feature size F while widthsW_(sl) may be greater than half of feature size F.

It will be appreciated that, since the even and odd word lines are notcreated in the same step, they may be of slightly different widths.

With the word lines generated, the manufacturing may continue as isknown in the art.

It will be appreciated that the ratios discussed hereinabove areexemplary only. Any suitable sub-F word line width W_(sl) and sub-Finsulator width D_(sl) between word lines may be created, from anyoriginal mask elements. For example, for the 63 nm technology, thefollowing word line and insulator widths represent some of the elementswhich may be created from elements laid down by masks (listed as awidth/space ratio):

Word line Insulator Lithography Width W_(sl) Spacing Word line (W/D)(nm/nm) (nm) D_(sl) (nm) pitch 75/75 50 25 1.2 F 75/75 40 35 1.2 F100/100 63 37 1.65 F 63/63 40 23 1 F

It will further be appreciated that the sub-F elements are generatedfrom mask elements which are of minimum feature size F or larger.Moreover, the sub-F elements are all self-aligned—each one is generatedfrom existing elements and not via lithography and thus, may scale withsmaller lithographies.

It will further be appreciated that the method of the present inventionmay be utilized to generate feature-size word lines (of feature size F)with sub-F spacing. This can be done by starting with an appropriatestarting pitch.

Reference is now made to FIG. 7, which illustrates an exemplary methodfor pre-word line patterning (step 100 of FIG. 4A). Reference is alsomade to FIGS. 8A, 8B and 8C which show the results of various steps ofFIG. 7.

After preparation of substrate 42 (FIG. 8A), ONO layer 33 may be laiddown (step 200) over the entire wafer, where, in an exemplaryembodiment, the bottom oxide layer may be 2-5 nm thick, the nitridelayer may be 5 nm thick and the gate oxide layer may be 12-14 nm thick.

In step 204, a first polysilicon layer 31 may be laid down over theentire chip. A nitride hard mask 36 may then be deposited (step 206) ina column pattern covering the areas of the memory array not destined tobe bit lines. FIG. 8A shows the results of step 206. Two columns ofnitride hard mask 36 are shown on top of polysilicon layer 31, whichoverlays ONO layer 33.

An etch may be performed (step 208) to generate bit line openings 37 byremoving the areas of polysilicon layer and the oxide and nitride layersbetween columns of nitride hard mask layer 36. FIG. 8B shows the resultsof the etch process. Two columns 54 of first polysilicon and nitridehard mask 36 are shown on top of columns, now labeled 55, of ONO layer33. The bottom oxide, labeled 39, is shown in bit line openings 37.

A pocket implant 51 (FIG. 8B), such as of Boron (BF₂), may now beimplanted (step 210) next to or under polysilicon columns 54. Anexemplary pocket implant may be of 1-3×10¹³/cm² at an angle of 0-15°,where the angle may be limited by the width of bit line opening 37 andthe height of polysilicon columns 54 covered by nitride hard mask 36.Part of pocket implant 51 may scatter and diffuse under polysiliconcolumns 54. In an alternative embodiment, the pocket implant may be ofBoron or Indium.

In step 211, nitride hard mask 36 may be removed.

In step 212, spacers 41 may be generated on the sides of polysiliconcolumns 54. For example, spacers 41 may be generated by deposition of anoxide liner, such as of 12 nm, and an anisotropic etch, to create thespacer shape. Alternatively, the liner may be left as it is withoutforming a spacer.

Spacers 41 may decrease the width of bit line openings, labeled 37′ inFIG. 8C, in order to reduce the width of the about-to-be implanted bitlines and to increase the effective length of the channels between bitlines.

Once spacers 41 have been formed, bit lines 50 may be implanted (step214), followed by a rapid thermal anneal (RTA). In one exemplaryembodiment, the bit line implant is of Arsenic of 2×10¹⁵/cm² at 10-20Kev and with an angle of 0 or 7% to the bit line.

In step 216, an oxide filler 52 may be deposited on the chip. As can beseen in FIG. 8C, oxide filler 52 may fill reduced bit line openings 37′and may cover other parts of the chip. In step 218, a CMP (chemicalmechanical planarization) process may be performed to remove excessoxide filler 52. The result of step 218 may be seen in FIG. 5, discussedpreviously.

Reference is now made to FIGS. 9A and 9B, which illustrate analternative embodiment of the present invention in which the word linesare formed of metal rather than of polysilicon. Reference is also madeto FIGS. 10A-10D which illustrate the output of various steps of FIGS.9A and 9B.

Applicants have realized that a “Dual Damascene” type process, used insemiconductor technology for creating metal lines (known as the “metal 1layer”) above the array, may be utilized herein to create metal wordlines above polysilicon gates. This new process is shown in FIGS. 9A and9B, which process is very similar to that shown in FIGS. 4A and 4B andthus, only the changed steps will be described hereinbelow.

The method begins with steps 100, 101, 102 and 104 of FIG. 4A to createthe extended mask structure, formed from rows 60 and spacers 62′, abovepolysilicon columns 54. The method may then deposit (step 220) evenmetal rows 221, such as copper or tungsten, into reduced spaces 61′rather than polysilicon rows 64 as before. Metal rows 221 may then beplanarized, resulting in the structure shown in FIG. 10A.

The method then continues with steps 108 (removing 1^(st) mask) and 110(creating extended mask) of FIG. 4A. However, in this embodiment, theextended mask is formed of even metal rows 221 and spacers 72′. In step222, odd metal rows 223 may be deposited into spaces 70′ (from FIG. 6G).Metal rows 221 may then be planarized, resulting in the structure shownin FIG. 10B.

Because even and odd rows 221 and 223, respectively, are formed ofmetal, there is no need to put an oxide cap on them, and thus, step 114is not included in this embodiment.

The method may proceed with removing (step 116) sub-F mask 72′, leavingspaces between neighboring metal rows 221 and 223. In step 224,polysilicon columns 54 may be etched to create polysilicon gates 54′,using metal rows 221 and 223 as masks for the etch. The result is shownin FIG. 10C and an expanded isometric view, showing gates 54′ moreclearly, is shown in FIG. 10D.

The process may continue as before, filling (step 120) the spacesbetween word lines with insulator and planarizing (step 122).

Spacer Embodiment

Applicants have realized that spacer technology may also be used tocreate sub-F word lines. The cell size may thus be reduced significantlyby having 2 word lines in the same or a slightly larger pitch than inthe prior art while still employing standard lithography. For example,there may be 2 word lines in a pitch of 2.8 F (translating to 1 wordline in a 1.4 F pitch). Such an array may result in a cell size of lessthan the 4 F² theoretical minimum of the prior art. Accordingly, in analternative preferred embodiment of the present invention, spacertechnology may be used to produce a sub 2 F pitch for a word line.

Reference is now made to FIG. 11, which illustrates a novel, dense array400, constructed and operative in accordance with the present invention.Array 400 may reduce the minimum size of a memory cell, by providingsub-minimum-feature-size, sub-F, spacer word lines 330 (with word linewidths that are less than 1 F) along with feature-size or smaller widthspaces 335 (where spacings 335 are 1 F or less).

For example, in FIG. 11, spacer word lines 330 are shown as an exemplary0.4 F. It will be appreciated that the widths of spacer word lines 330in FIG. 11 are exemplary; other sub-F widths are possible and areincluded in the present invention. Bit lines 340 and bit line spaces 345may have, as in the DPP prior art, widths of 1 F and 1.6 F respectively.

Assuming a pitch of 2.6 F for the bit line dimension, the cell size ofthe example in FIG. 11 may be 2.6 F×1.4 F=3.64 F², which is less thanthe theoretical minimum (of 4 F²) of the prior art. It will beappreciated that the word line and bit line pitches of the example inFIG. 11 are exemplary; other pitches are possible and are included inthe present invention. The theoretical limits for the present inventionare defined by a pitch of 1 F between spacer word lines 330 and a pitchof 2 F between bit lines 340. Accordingly an exemplary embodiment of thepresent invention may provide a cell 38 whose size is 1 F×2 F=2 F². Itwill therefore be appreciated that, by using spacers as the word lines,the present invention has redefined the theoretical minimum cell size.It will also be appreciated that the width of spacer word line 330 has adirect effect on the amount of current required for programming. Widerspacer word lines 330 may generally require higher currents forprogramming. Accordingly, as spacer word lines 330 may be less wide thanthe prior art of 1 F, they may in general require lower currents than inthe prior art for programming, resulting in lower power consumptionduring programming.

It will be appreciated that the present invention may also beimplemented in non-DPP type memory cells, and also for non-NROM typememory cells. Furthermore, the memory cells may store 2 bits or 4 bits,with no change in the basic physics and operating mode of the cell.

In accordance with a preferred embodiment of the present invention andas will be shown hereinbelow, sub-F elements may be generated fromelements which are the minimum feature size F or larger. As will bedescribed herein below, the present invention utilizes commonlithographic concepts to generate such small features.

Reference is now made to FIG. 12, which illustrates the process and toFIGS. 13A-26B, which illustrate various steps within the process of FIG.12. FIG. 12 shows two alternative methods which will be described hereinbelow, the first one, associated with FIGS. 13A-24B, which enables ananti-punchthrough implant between spacer word lines to be implanted andthe second one, associated with FIGS. 25A-26B, which has no suchanti-punchthrough implant.

The process begins, in step 402, with the process steps prior to wordline patterning. The results of these steps are illustrated in FIGS. 13Aand 13B. FIG. 13A shows a top view of array 400, whereas FIG. 13B showsa cross section along horizontal lines B-B, viewing multiple bit lines370. FIG. 13A shows alternating lines of oxide 350 and nitride 360. Asshown in FIG. 13B, oxides 350 may be located on top of bit lines 370,which may, for example, be created with arsenic implants. Underneathnitrides 360 may be a polysilicon liner 385 and an oxide-nitride-oxide(ONO) layer 380. It will be appreciated that bit line oxides 350 and bitlines 370 may have been formed using a lithographic process, thusresulting in a bit line width of 1 F. In accordance with a preferredembodiment of the present invention, the width of nitrides 360 and ONOlayer 380 may be 1.6 F, with a minimum limit of 1 F.

The pre-word line patterning process steps may be any suitable set ofsteps, an exemplary set of which may be found in the followingapplications assigned to the common assignees of the present invention,which applications are incorporated herein by reference: U.S. patentapplication Ser. No. 11/247,733 filed Oct. 11, 2005, U.S. patentapplication Ser. No. 11/336,093 filed Jan. 20, 2006 and U.S. patentapplication Ser. No. 11/440,624, filed 24 May 2006.

Returning to FIG. 12, the first step in word line processing is to form(step 410) retaining walls next to which the spacer word lines may bedeposited using a conductive material such as, for example, polysilicon.As shown from above in FIG. 14A, initially, the entire array 400 may becovered with a second layer of nitride 390 which may constitute a hardcap for lithographic purposes. A cross-sectional view in FIG. 14B showshow nitride 390 may cover the previously deposited materials.

FIG. 15A illustrates a top view of array 400 that has been rotated 90degrees in a clockwise direction when compared to FIG. 14A. This figureillustrates how nitride 390 may then be etched to create word lineretaining walls 390′. Elements of polysilicon liner 385 exposed by thisoperation may then be removed as well with a wet etch. It will beappreciated, that the width of word line retaining walls 390′ may be 1 For larger, due to the restrictions of lithographic operations. In apreferred embodiment of the present invention, the distance D betweeneach word line retaining wall 390′ may be, for example, 1.8 F.

It will be appreciated that the mask for etching nitride 390 may be thesame or similar to the prior art mask for generating word lines.However, in the present invention, the mask is used to create retainingwalls 390′.

FIG. 15B shows a vertical cross-section along lines B-B, viewingmultiple word lines. FIG. 16B illustrates how the remaining elements ofnitride 360 provide a base for word line retaining walls 390′. It willthus be appreciated that both retaining walls 390′ and nitride 360consist of the same material and may later be removed in a single step.

As shown in FIG. 16A, spacer word lines 330 may then be generated (step420) as polysilicon spacers adjacent to word line retaining walls 390′.The polysilicon spacers may be generated by first laying down apolysilicon liner and then etching the liner back. A Reactive IonEtching (RIE) may be used to guarantee continuity of spacer word lines330 over bit line oxides 350.

FIG. 16B shows a cross-sectional view of array 400 after spacer wordlines 330 have been generated. It will be appreciated that spacer wordlines 330 may be spacers and not created lithographically. Accordingly,spacer word lines 330 may have widths of less than 1 F. In accordancewith an exemplary embodiment of the present invention, the width ofspacer word lines 330 may be 0.4 F.

It will be appreciated that the width of spacer word lines 330 may nolonger be affected by the limitations of lithography. Spacer dimensionsmay depend only on layer thickness in deposition and may thereforetheoretically reach atomic dimensions. However, in light of practicalconsiderations such as narrow channel effects, cell width variations andmore, the minimum width for spacer word lines 330 may be defined as 0.1F.

In accordance with a preferred embodiment of the present invention, antipunch through (APT) implants may be included in the process. If antipunch through (APT) implants are required (as checked in step 422),oxide spacers 410 may then be deposited (step 425) adjacent to spacerword lines 330 (FIG. 17A). It will be appreciated that oxide spacers 410may be located on top of ONO 380 and may provide support to spacer wordlines 330 during an implant process. ONO 380 may then be etched (step428) in order to facilitate an anti punch through (APT) implant. FIG.17B provides a cross sectional view of FIG. 17A and illustrates theresults of such etching. Elements of ONO 380 may remain under spacerword lines 330, spacer word line retaining walls 390′, and oxide spacers410. However, between oxide spacers 410, substrate 305 may now beexposed.

As illustrated in FIGS. 18A and 18B, a first set of APT implants 420 maynow be implanted (step 430) in the exposed elements of substrate 305. Asshown in FIGS. 19A and 19B, an oxide filler 415 may then be deposited(step 440) over first APT implants 420.

It will be appreciated that steps 425 and 428 are optional. In analternate embodiment of the present invention, APT implants 420 may beimplanted (step 430) directly through ONO layer 380 without depositingoxide spacers 410 or etching ONO layer 380. Oxide filler 415 may then bedeposited (step 340) in the area containing both oxide spacers 410 andoxide filler 415 in the previous embodiment.

In accordance with a preferred embodiment of the present invention,array 400 may also be planarized at this point to remove excess oxidefill. An exemplary planarizing operation may be chemical-mechanicalpolishing (CMP). Thus, as illustrated in FIG. 19B, array 400 may now befilled to a uniform height. It will be appreciated the oxide spacers 410and oxide filler 415 may consist of the same material and accordinglymay now in effect comprise a uniform filler between spacer word lines330.

Word line retaining walls 390′ may now be removed (step 450), such aswith a nitride etch. If anti punch through (APT) implants are required(as checked in step 452), oxide spacers 411 may then be deposited (step455) adjacent to spacer word lines 330. FIGS. 20A and 20B show theresults of step 455. Bit line oxides 370 and ONO layer 380 have beenexposed from underneath the removed retaining walls 390′. Oxide spacers411 are next to spacer word lines 330 and may partially cover elementsof ONO 380 that had previously been exposed by the removal of word lineretaining walls 390′.

In accordance with a preferred embodiment of the present invention, theremaining exposed portions of ONO 380 may then be etched (step 458) inorder to facilitate a second APT implant. FIGS. 21A and 21B illustratethe results of such etching. Similar to the preparation for first APTimplants 420 (FIGS. 17A and 17B), substrate 305 may now be exposed, andelements of ONO 380 may remain under spacer word lines 330 and oxidespacers 410 and 411. However, now there may be no remaining word lineretaining walls 390′.

As illustrated in FIGS. 22A and 22B, a second APT implant 425 may thenbe implanted (step 460) in exposed substrate 305. FIG. 23A shows how anoxide fill 418 may then be deposited (step 470) to cover APT implant425.

It will be appreciated that steps 455 and 458 are optional. In analternate embodiment of the present invention, APT implants 425 may beimplanted (step 460) directly through ONO layer 380 without depositingoxide spacers 411 or etching ONO layer 380. Oxide filler 418 may then bedeposited (step 440) in the area containing both oxide spacers 410 andoxide filler 418 in the previous embodiment.

After oxide fill 418 is deposited, array 400 may be planarized as instep 440, using for example, a CMP process to remove excess oxide filler418 above the level of spacer word lines 330. After the CMP process isperformed, the only exposed elements remaining may be the polysiliconfrom spacer word lines 330 and oxides 410, 411, 415, and 418. An oxideetch-back may then be employed to expose spacer word lines 330 to adepth of, for example, approximately twice the spacer thickness forexample. The cross sectional view in FIG. 23B illustrates the results ofthis etch. Spacer word lines 330 may rest on ONO 380 and may extendabove surrounding oxides 410, 411, 415 and 418. It will also beappreciated that portions of ONO 380 may also extend underneath oxidespacers 410 and 411.

As illustrated in FIGS. 24A and 24B, spacer word line salicidation maynow be performed (step 480) to salicide the exposed spacer word lines330. For example, cobalt or tungsten may be used in this process. Thisstep may complete the creation of array 400.

It will be appreciated that, as stated hereinabove, the width of spacerword lines 330 may be 0.4 F. It will also be appreciated that thecombined width of an oxide 410, oxide 415 and a second oxide 410 may be1 F. Similarly, the combined width of an oxide 411, oxide 418 and asecond oxide 411 may also be 1 F. Accordingly, it will be appreciatedthat array 400 may have a pitch of one word line for every 1.4 F, asopposed to the previous minimal pitch of one word line per 2 F asdescribed hereinabove for the prior art.

It will be appreciated that the values provided in the embodimentprovided above are exemplary only. Polysilicon spacer word lines 330 mayhave a width of 0.1 F-0.5 F. Similarly, width spaces 335 may be 1 F orsmaller. The constraint may be that the pitch of the mask for word lineretaining walls 390′ may be 2 F. This may be split between wall width of0.8 F and width space of 1.2 F or some other arrangement.

In an alternative embodiment of the present invention, array 400 may nothave anti punchthrough implants.

This alternative embodiment is also illustrated in FIG. 12. The stepsfor this embodiment may include steps 402-420 of the previous embodimentat which point, spacer word lines 330 may be created (as illustrated inFIGS. 16A and 16B) next to word line retaining walls 390′.

As APT implants are not required (as checked in step 422), the next stepmay be to deposit (step 440) oxide filler 415′ between spacer word line330. As in the previous embodiment, array 400 may also be planarized atthis point to remove excess oxide filler. Reference is now made to FIGS.25A and 25B which illustrate the results of step 440. Oxide filler 415′may be on top of ONO layer 380, and may fill the entire area betweenspacer word lines 330. It will be appreciated that the areas covered byoxide filler 415′ may be equivalent to the areas that may be covered byoxide spacers 410 and oxide filler 415 in the previous embodiment.

Step 450 may then proceed as in the previous embodiment to removeretaining walls 390′. As illustrated in FIGS. 26A and 26B, to whichreference is now made, retaining walls 390′ may be removed and ONO layer380 exposed between spacer word lines 330.

Again assuming that APT implants are not required (as checked in step452), the next step may be to deposit (step 470) oxide filler 418′ inthe area previously filled by retaining walls 390′. As in the previousembodiment, array 400 may also be planarized at this point to removeexcess oxide filler. FIGS. 26A and 26B illustrate the results of step470. Oxide filler 415′ may be on top of ONO layer 380, and may fill theentire area between spacer word lines 330. It will be appreciated thatthe areas covered by oxide filler 418′ may be equivalent to the areasthat may be covered by oxide spacers 411 and oxide filler 418 in theprevious embodiment.

Processing may continue with word line salicidation (step 480) as in theprevious embodiment. When comparing FIGS. 23A and 23B of the previousembodiment to FIGS. 26A and 26B of the present embodiment, it will beappreciated that other than the absence of APT implants and the etchingof ONO 380 required to facilitate such implants, there may be nomaterial differences between memory arrays 400 manufactured via the twoembodiments. In both embodiments, there may be oxide fillers betweenspacer word lines 330. In the previous embodiment such fillers may becomprised of oxide spacers 410 and 411 as well as oxide fillers 415 and418. In the present embodiment such fillers may be comprised of oxidefillers 415′ and 418′.

It will thus be appreciated that there may be no material differencebetween the sizes of memory cells 38 (FIG. 11) manufactured via the twoembodiments. Other than the absence of APT implants and the existence ofmore elements of ONO 380, the results of the present embodiment may begenerally similar to those of the previous embodiment.

While certain features of the invention have been illustrated anddescribed herein, many modifications, substitutions, changes, andequivalents will now occur to those of ordinary skill in the art. It is,therefore, to be understood that the appended claims are intended tocover all such modifications and changes as fall within the true spiritof the invention.

1. A non-volatile memory array comprising: word lines of a sub-F width(sub-minimum feature size F); said word lines spaced a sub-F widthapart; bit lines generally perpendicular to said word lines; and whereinsaid sub-F word line width is at least 0.5 F and said sub-F spacing isless than 0.5 F.
 2. The array according to claim 1 and wherein saidarray is a NROM (nitride read only memory) array.
 3. The array accordingto claim 1 and wherein said sub-F spacing is filled with dielectric. 4.The array according to claim 3 and wherein said dielectric isoxide-nitride-oxide.
 5. A non-volatile memory array comprising: wordlines of a sub-F width (sub-minimum feature size F); said word lines arespaced a sub-F width apart; bit lines generally perpendicular to saidword lines; and wherein said sub-F word line width is at least 0.1 F andsaid sub-F spacing is at least 0.7 F.
 6. The array according to claim 5and wherein said word lines are formed from polysilicon spacers.